Commentaries

Commentary: Nano- and micromachining using laser plasma soft X-rays

[+] Author Affiliations
Tetsuya Makimura, Shuichi Torii

University of Tsukuba, Institute of Applied Physics, 1-1-1 Ten'nodai, Tsukuba, Ibaraki 305-8573 Japan

Hiroyuki Niino

National Institute of Advanced Industrial Science and Technology, Photonics Research Institute, Central 5, Tsukuba, Ibaraki 305-8565 Japan

Kouichi Murakami

University of Tsukuba, Institute of Applied Physics, 1-1-1 Ten'nodai, Tsukuba, Ibaraki 305-8573 Japan

J. Nanophoton. 4(1), 040305 (August 23, 2010). doi:10.1117/1.3488615
History: Received July 5, 2010; Revised August 6, 2010; Accepted August 9, 2010; August 23, 2010; Online August 23, 2010
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Abstract

A short technical commentary on a specific topic.

References

H. Fiedorowicz, A. Bartnik, M. Bittner, L. J. J. Krasa, P. Kubat, J. Mikolajczyk, and R. Rakowski, "Micromachining of organic polymers by direct photo-etching using a laser plasma x-ray source," Microelectron. Eng. 73-74, 336-339 (2004)
F. Barkusky, A. Bayer, C. Peth, and K. Mann, "Direct photoetching of polymers using radiation of high energy density from a table-top extreme ultraviolet plasma source," J. of Appl. Phys. 105, 014906 (2009)
T. Makimura, H. Miyamoto, Y. Kenmotsu, K. Murakami, and H. Niino,"Direct micromachining of quartz glass plates using pulsed laser plasma soft x-rays," Appl. Phys. Lett. 86, 103111 (2005)
T. Makimura and K. Murakami, "Dynamics of silicon plume generated by laser ablation and its chemical reaction," Appl. Surf. Sci. 96-98, 242-250 (1996)
T. Makimura, T. Sakuramoto, and K. Murakami, "Time-resolved X-ray absorption spectroscopy for laser-ablated silicon particles in xenon gas," Jpn. J. Appl. Phys. 35, L735-L737 (1996)
R. C. Spitzer, T. J.Orzechowski, D. W. Phillion, R. L. Kauffmann, and C. Cerjan, "Conversion efficiencies from laser-produced plasmas in the extreme ultraviolet regime," J. Appl. Phys. 79, 2251-2258 (1996)
B. L. Henke, E. M. Gullikson, and J. C. Davis, "X-ray interactions: Photoabsorption, scattering, transmission, and reflection at e=50-30,000 eV, z=1-92," At. Data Nucl. Data Tables 54, 181-342 (1993)
S. Torii, T. Fujimori, T. Makimura, H. Niino, and K. Murakami, "Ablation process of silica glass induced by laser plasma soft x-ray irradiation," Appl. Surf. Sci. 255, 9840-9842 (2009)
S. Torii, T. Makimura, K. Okazaki, D. Nakamura, A. Takahashi, T. Okada, H. Niino, and K. Murakami, "Direct etching of poly(methyl methacrylate) using laser plasma soft x-rays," Appl. Phys. Exp. 3, 066502 (2010)
© 2010 Society of Photo-Optical Instrumentation Engineers

Citation

Tetsuya Makimura ; Shuichi Torii ; Hiroyuki Niino and Kouichi Murakami
"Commentary: Nano- and micromachining using laser plasma soft X-rays", J. Nanophoton. 4(1), 040305 (August 23, 2010). ; http://dx.doi.org/10.1117/1.3488615


Figures

Tables

References

H. Fiedorowicz, A. Bartnik, M. Bittner, L. J. J. Krasa, P. Kubat, J. Mikolajczyk, and R. Rakowski, "Micromachining of organic polymers by direct photo-etching using a laser plasma x-ray source," Microelectron. Eng. 73-74, 336-339 (2004)
F. Barkusky, A. Bayer, C. Peth, and K. Mann, "Direct photoetching of polymers using radiation of high energy density from a table-top extreme ultraviolet plasma source," J. of Appl. Phys. 105, 014906 (2009)
T. Makimura, H. Miyamoto, Y. Kenmotsu, K. Murakami, and H. Niino,"Direct micromachining of quartz glass plates using pulsed laser plasma soft x-rays," Appl. Phys. Lett. 86, 103111 (2005)
T. Makimura and K. Murakami, "Dynamics of silicon plume generated by laser ablation and its chemical reaction," Appl. Surf. Sci. 96-98, 242-250 (1996)
T. Makimura, T. Sakuramoto, and K. Murakami, "Time-resolved X-ray absorption spectroscopy for laser-ablated silicon particles in xenon gas," Jpn. J. Appl. Phys. 35, L735-L737 (1996)
R. C. Spitzer, T. J.Orzechowski, D. W. Phillion, R. L. Kauffmann, and C. Cerjan, "Conversion efficiencies from laser-produced plasmas in the extreme ultraviolet regime," J. Appl. Phys. 79, 2251-2258 (1996)
B. L. Henke, E. M. Gullikson, and J. C. Davis, "X-ray interactions: Photoabsorption, scattering, transmission, and reflection at e=50-30,000 eV, z=1-92," At. Data Nucl. Data Tables 54, 181-342 (1993)
S. Torii, T. Fujimori, T. Makimura, H. Niino, and K. Murakami, "Ablation process of silica glass induced by laser plasma soft x-ray irradiation," Appl. Surf. Sci. 255, 9840-9842 (2009)
S. Torii, T. Makimura, K. Okazaki, D. Nakamura, A. Takahashi, T. Okada, H. Niino, and K. Murakami, "Direct etching of poly(methyl methacrylate) using laser plasma soft x-rays," Appl. Phys. Exp. 3, 066502 (2010)

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