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Effects of hydrogen pretreatment on physical-vapor-deposited nickel catalyst for multi-walled carbon nanotube growth

[+] Author Affiliations
Benjamin L. Crossley, Mauricio Kossler, Ronald A. Coutu, LaVern A. Starman, Peter J. Collins

Air Force Institute of Technology, Department of Electrical and Computer Engineering, 2950 Hobson Way, Wright-Patterson AFB, OH 45433

J. Nanophoton. 4(1), 049502 (February 17, 2010). doi:10.1117/1.3356218
History: Received January 5, 2010; Revised February 4, 2010; Accepted February 5, 2010; February 17, 2010; Online February 17, 2010
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Abstract

Physical vapor deposited nickel catalyst layers of 10, 50, 100, 200, 350, and 500 angstroms were granulated using hydrogen plasma for varying times to determine an effective carbon nanotube (CNT) growth process using microwave plasma enhanced CVD (MPECVD). Nickel was deposited via sputtering or evaporation. The catalyst granule size, density, and resulting CNTs were analyzed. Sputtered nickel of 50 angstroms with 5 minutes of hydrogen plasma pretreatment resulted in the most effective CNT growth.

© 2010 Society of Photo-Optical Instrumentation Engineers

Citation

Benjamin L. Crossley ; Mauricio Kossler ; Ronald A. Coutu ; LaVern A. Starman and Peter J. Collins
"Effects of hydrogen pretreatment on physical-vapor-deposited nickel catalyst for multi-walled carbon nanotube growth", J. Nanophoton. 4(1), 049502 (February 17, 2010). ; http://dx.doi.org/10.1117/1.3356218


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