Special Section on Nanophotonics in Japan

Metallized slit-shaped pyramidal Si probe with extremely high resolution for 1.5-Tbit/in2 density near-field optical storage

[+] Author Affiliations
Takashi Yatsui

Japan Science and Technology Agency

Wataru Nomura, Motoichi Ohtsu

University of Tokyo

J. Nanophoton. 1(1), 011550 (September 17, 2007). doi:10.1117/1.2794357
History: Received June 30, 2007; Revised August 28, 2007; Accepted September 7, 2007; September 17, 2007; Online September 17, 2007
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Abstract

We have developed a near-field optical probe by introducing the metallized pyramidal structure of a Si probe with a slit-shaped tip for high-density optical storage. Numerical analysis using the finite-difference time-domain method showed that the optical spot generated at the aperture measured 13×30 nm. We fabricated a slit-type Si probe and evaluated the spot size using fluorescence imaging of a single dye molecule. The full-width at half maximum of the signal profiles was 16 nm×26 nm, which corresponds to a data density of 1.5 Tbit/in2. Furthermore, a large extinction coefficient depending on the polarization was confirmed.

© 2007 Society of Photo-Optical Instrumentation Engineers

Citation

Takashi Yatsui ; Wataru Nomura and Motoichi Ohtsu
"Metallized slit-shaped pyramidal Si probe with extremely high resolution for 1.5-Tbit/in2 density near-field optical storage", J. Nanophoton. 1(1), 011550 (September 17, 2007). ; http://dx.doi.org/10.1117/1.2794357


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