Research Papers

Improving deep subwavelength imaging through terminal interface design of metallo-dielectric multilayered stacks

[+] Author Affiliations
Jigang Hu

Hefei University of Technology, Department of Optics and Optical Engineering, No. 193 Tunxi Road, Hefei, Anhui, 230009, China

Qiwen Zhan

University of Dayton, Electro-Optics Program, 300 College Park, Dayton, Ohio 45469-2951

Junxue Chen

University of Science and Technology of China, Department of Optics and Optical Engineering, Anhui Key Laboratory of Optoelectronic Science and Technology, No. 96 Jinzhai Road, Hefei, Anhui, 230026, China

Xiangxian Wang

University of Science and Technology of China, Department of Optics and Optical Engineering, Anhui Key Laboratory of Optoelectronic Science and Technology, No. 96 Jinzhai Road, Hefei, Anhui, 230026, China

Yonghua Lu

University of Science and Technology of China, Department of Optics and Optical Engineering, Anhui Key Laboratory of Optoelectronic Science and Technology, No. 96 Jinzhai Road, Hefei, Anhui, 230026, China

Hai Ming

University of Science and Technology of China, Department of Optics and Optical Engineering, Anhui Key Laboratory of Optoelectronic Science and Technology, No. 96 Jinzhai Road, Hefei, Anhui, 230026, China

J. Nanophoton. 7(1), 073091 (May 14, 2013). doi:10.1117/1.JNP.7.073091
History: Received October 15, 2012; Revised March 19, 2013; Accepted April 11, 2013
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Abstract.  Symmetric metallo-dielectric multilayered stacks (MDMS) are investigated to improve the spatial resolution of subwavelength imaging operated in canalization regime. Simulation results revealed that subwavelength imaging capability is very sensitive to the thickness and material of the MDMS terminal layers. Furthermore, the coupling and decoupling of the Bloch modes in MDMS, between the object and image space, strongly depend on the terminal layer parameters which can be tuned to achieve the optimal imaging improvement. In contrast to metal-dielectric periodic MDMS, using MDMS with the developed symmetric surface termination, subwavelength imaging with optimal intensity throughput and improved field spatial resolution (20.4%) can be obtained. Moreover, optical singularity, in the form of Poynting vector saddle point, has been found in the free space after lens exit for the two kinds of symmetric MDMS that exhibit improved superresolution imaging performance with 100% energy flux visibility. The improved subwavelength imaging capabilities, offered by this proposed termination design method, may find potential applications in the areas of biological imaging, sensing, and deep subwavelength lithography, and many others.

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© 2013 Society of Photo-Optical Instrumentation Engineers

Citation

Jigang Hu ; Qiwen Zhan ; Junxue Chen ; Xiangxian Wang ; Yonghua Lu, et al.
"Improving deep subwavelength imaging through terminal interface design of metallo-dielectric multilayered stacks", J. Nanophoton. 7(1), 073091 (May 14, 2013). ; http://dx.doi.org/10.1117/1.JNP.7.073091


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