Special Section on Nanostructured Thin Films: Latest Developments in Theory and Practice

Tunable stoichiometry of BCxNy thin films through multitarget pulsed laser deposition monitored via in situ ellipsometry

[+] Author Affiliations
John G. Jones

Air Force Research Laboratory, 3005 Hobson Way, Wright-Patterson AFB, Ohio 45433

Lirong Sun

General Dynamics Information Technology, 5100 Springfield Road, Dayton, Ohio 45431

Neil R. Murphy

Air Force Research Laboratory, 3005 Hobson Way, Wright-Patterson AFB, Ohio 45433

Tyson C. Back

Universal Technology Corporation, 1270 North Fairfield Road, Dayton, Ohio 45532

Matthew A. Lange

Universal Technology Corporation, 1270 North Fairfield Road, Dayton, Ohio 45532

Jessica L. Remmert

Universal Technology Corporation, 1270 North Fairfield Road, Dayton, Ohio 45532

P. Terrence Murray

University of Dayton Research Institute, 300 College Park, Dayton, Ohio 45469

Rachel Jakubiak

Air Force Research Laboratory, 3005 Hobson Way, Wright-Patterson AFB, Ohio 45433

J. Nanophoton. 8(1), 083999 (Feb 05, 2014). doi:10.1117/1.JNP.8.083999
History: Received November 4, 2013; Revised December 22, 2013; Accepted January 6, 2014
Text Size: A A A

Abstract.  Pulsed laser deposition is an energetic deposition technique in which thin films are deposited when a laser pulse at 248-nm wavelength strikes a target and material is subsequently deposited onto a substrate with ideally the same stoichiometry. By synchronizing a high-speed mirror system with the pulsing of the laser, and using two separate targets, thin films having tunable stoichiometry have been deposited. Depositions were performed in a high vacuum environment to obtain as much kinetic energy as possible during growth. Typically, some 150 pulses at 300mJ/pulse were required to deposit 1 nm. Island growth must occur on a per pulse basis since over 100 pulses are required to deposit a 1 nm film thickness. Films were deposited to 100-nm thickness, and in situ ellipsometry data were modeled to calculate thickness, n and k. X-ray photoelectron spectroscopy (XPS), Raman spectroscopy, and atomic force microscopy (AFM) were all performed on each of the films. XPS demonstrated change in film composition with change in laser pulse ratio; ellipsometry displayed thickness from the model generated as well as the optical properties from 370 to 1690 nm. AFM thickness measurements were in agreement with independently modeled ellipsometry thickness values.

Figures in this Article
© 2014 Society of Photo-Optical Instrumentation Engineers

Citation

John G. Jones ; Lirong Sun ; Neil R. Murphy ; Tyson C. Back ; Matthew A. Lange, et al.
"Tunable stoichiometry of BCxNy thin films through multitarget pulsed laser deposition monitored via in situ ellipsometry", J. Nanophoton. 8(1), 083999 (Feb 05, 2014). ; http://dx.doi.org/10.1117/1.JNP.8.083999


Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.