10 July 2014 Plane demagnifying nanolithography by hybrid hyperlens–superlens structure
Gaofeng Liang, Zeyu Zhao, Na Yao, Changtao Wang, Bo Jiang, Qing Zhao, Xiangang Luo
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Abstract
We propose a hybrid hyperlens–superlens structure to achieve demagnifying nanolithography. It consists of a core of planar superlens and a shell of cylinder hyperlens. In the nanolithography process, the shell of the cylinder hyperlens could demagnify the mask patterns to the interior cylinder interface, and then the core of the planar superlens transmits the demagnified patterns to the planar output photoresist layer. The performance of this hybrid hyperlens–superlens structure is analyzed for different periods and spacing of mask and demagnification factors. The numerical simulation results agree well with the theory. It is demonstrated that the hybrid structure could be used as a superresolution device for plane demagnifying nanolithography.
© 2014 Society of Photo-Optical Instrumentation Engineers (SPIE) 0091-3286/2014/$25.00 © 2014 SPIE
Gaofeng Liang, Zeyu Zhao, Na Yao, Changtao Wang, Bo Jiang, Qing Zhao, and Xiangang Luo "Plane demagnifying nanolithography by hybrid hyperlens–superlens structure," Journal of Nanophotonics 8(1), 083080 (10 July 2014). https://doi.org/10.1117/1.JNP.8.083080
Published: 10 July 2014
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CITATIONS
Cited by 10 scholarly publications and 1 patent.
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KEYWORDS
Nanolithography

Multilayers

Silver

Interfaces

Metals

Super resolution

Chromium

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