Special Section on Nanophotonic Materials and Devices

Correction of positioning error in Talbot lithography under noncoherent illumination

[+] Author Affiliations
Milad Gharooni, Bahador Valizadeh, Shams Mohajerzadeh

University of Tehran, School of Electrical and Computer Engineering, Thin Film and Nanoelectronics Lab, Nanoelectronics Center of Excellence, Tehran 143957131, Iran

Abbas Chimeh

University of Tehran, School of Electrical and Computer Engineering, Thin Film and Nanoelectronics Lab, Nanoelectronics Center of Excellence, Tehran 143957131, Iran

University of Tehran, School of Electrical and Computer Engineering, Photonics Research Lab, Center of Excellence on Applied Electromagnetic Systems, Tehran 143957131, Iran

Mahmoud Shahabadi

University of Tehran, School of Electrical and Computer Engineering, Photonics Research Lab, Center of Excellence on Applied Electromagnetic Systems, Tehran 143957131, Iran

J. Nanophoton. 8(1), 084089 (Nov 06, 2014). doi:10.1117/1.JNP.8.084089
History: Received February 13, 2014; Revised 00 00, 0000; Accepted October 16, 2014
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Abstract.  A method for the correction of positioning error in Talbot lithography is proposed and investigated both experimentally and theoretically. The enhancement of the features in this method is achieved by the temporally noncoherent illumination, which leads to the overlap between Talbot images of different frequencies. This results in an improvement in the depth of focus and, thus, less sensitive patterns to the positioning error. A spectral-domain analysis for the estimation of the positioning error is employed for the verification and finding of a criterion for selecting appropriate light sources.

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© 2014 Society of Photo-Optical Instrumentation Engineers

Citation

Milad Gharooni ; Abbas Chimeh ; Bahador Valizadeh ; Shams Mohajerzadeh and Mahmoud Shahabadi
"Correction of positioning error in Talbot lithography under noncoherent illumination", J. Nanophoton. 8(1), 084089 (Nov 06, 2014). ; http://dx.doi.org/10.1117/1.JNP.8.084089


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