Research Papers

Multiexposure laser interference lithography

[+] Author Affiliations
Abdollah Hassanzadeh, Mohammadbagher Mohammadnezhad

University of Kurdistan, Department of Physics, Faculty of Science, University St., Sanandaj, Kurdistan, 416/6613566176, Iran

Silvia Mittler

University of Western Ontario, Department of Physics and Astronomy, London, N6A 3K7, Canada

J. Nanophoton. 9(1), 093067 (Jul 02, 2015). doi:10.1117/1.JNP.9.093067
History: Received November 27, 2014; Accepted June 3, 2015
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Abstract.  Nanopatterns resulting from two-beam interference in single, double, and multiexposures were simulated. Several patterns were experimentally fabricated to compare with the simulated patterns, allowing judgment of the quality of the simulation tool. Experimental and simulation results were consistent for single and double exposures. Photoresist nanofibers attached and detached from the substrate were fabricated with few changes in the development process. Results show that by increasing the number of exposures, a wide variety of patterns with very fine structures and sophisticated geometries can be generated. Fresnel-lens type structures are formed when the number of exposures is increased. These Fresnel-like patterns might have potential use in obtaining radial and azimuthal polarizations and optical vortices in addition to areas such as security patterns and diffractive optical elements.

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© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Abdollah Hassanzadeh ; Mohammadbagher Mohammadnezhad and Silvia Mittler
"Multiexposure laser interference lithography", J. Nanophoton. 9(1), 093067 (Jul 02, 2015). ; http://dx.doi.org/10.1117/1.JNP.9.093067


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