Special Section on Nanocarbon Photonics and Optoelectronics

Fluid modeling for plasma-enhanced direct current chemical vapor deposition

[+] Author Affiliations
Rinat R. Ismagilov, Victor I. Kleshch, Sergei A. Malykhin, Andrey M. Alexeev

M.V. Lomonosov Moscow State University, Department of Physics, Leninskie Gory 1, Moscow 119991, Russia

A.M. Prokhorov General Physics Institute of the RAS, Vavilov Street 38, Moscow 119991, Russia

Ildar R. Khamidullin

Bashkir State University, Department of Economics and Mathematics, Traktovaya Street 1, Neftekamsk 452681, Russia

Alexander N. Obraztsov

M.V. Lomonosov Moscow State University, Department of Physics, Leninskie Gory 1, Moscow 119991, Russia

A.M. Prokhorov General Physics Institute of the RAS, Vavilov Street 38, Moscow 119991, Russia

University of Eastern Finland, Department of Physics and Mathematics, P.O. Box 111, Yliopistokatu 7, Joensuu 80101, Finland

J. Nanophoton. 10(1), 012503 (Sep 28, 2015). doi:10.1117/1.JNP.10.012503
History: Received August 6, 2015; Accepted August 31, 2015
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Abstract.  A self-consistent continuum (fluid) model for a direct current discharge used in a chemical vapor deposition system is developed. The model is built for a two-dimensional axisymmetric system and incorporates an electron energy balance for low-pressure Ar gas. The underlying physics of the fluid model is briefly discussed. The fluid and Poisson equations for plasma species are used as the model background. The plasma species considered in the model include electrons, Ar+ ions, and Ar atoms in ground and excited states. Nine reactions between these species are taken into account, including surface reactions. The densities of various plasma species as well as the relative contributions of generation and annihilation processes for electrons, ions, and atoms are calculated. The concentrations for electrons and Ar+ ions on the order of 1020m3 are obtained for the plasma in the computer simulations.

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© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Rinat R. Ismagilov ; Ildar R. Khamidullin ; Victor I. Kleshch ; Sergei A. Malykhin ; Andrey M. Alexeev, et al.
"Fluid modeling for plasma-enhanced direct current chemical vapor deposition", J. Nanophoton. 10(1), 012503 (Sep 28, 2015). ; http://dx.doi.org/10.1117/1.JNP.10.012503


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