Special Section on Nanocarbon Photonics and Optoelectronics

Atomic layer deposition of TiO2 and Al2O3 on nanographite films: structure and field emission properties

[+] Author Affiliations
Victor I. Kleshch, Rinat R. Ismagilov, Elena A. Smolnikova

Lomonosov Moscow State University, Department of Physics, Leninskie gory 1/2, Moscow 119991, Russia

Ekaterina A. Obraztsova

Shemyakin-Ovchinnikov Institute of Bioorganic Chemistry of the Russian Academy of Sciences, str. Miklukho-Maklaya 16/10, Moscow 117997, Russia

National University of Science and Technology MISiS, Leninskiy prospekt 2, Moscow 119049, Russia

Prokhorov Institute of General Physics, Russian Academy of Sciences, str. Vavilova 38, Moscow 119991, Russia

Feruza Tuyakova

Moscow State Institute of Radio Engineering, Vernadsky prospekt 78, Moscow 119454, Russia

University of Eastern Finland, Department of Physics and Mathematics, P.O.B 111, Joensuu 80101, Finland

Alexander N. Obraztsov

Lomonosov Moscow State University, Department of Physics, Leninskie gory 1/2, Moscow 119991, Russia

University of Eastern Finland, Department of Physics and Mathematics, P.O.B 111, Joensuu 80101, Finland

J. Nanophoton. 10(1), 012509 (Nov 05, 2015). doi:10.1117/1.JNP.10.012509
History: Received July 28, 2015; Accepted September 16, 2015
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Abstract.  Atomic layer deposition (ALD) of metal oxides (MO) was used to modify the properties of nanographite (NG) films produced by direct current plasma–enhanced chemical vapor deposition technique. NG films consist of a few layers of graphene flakes (nanowalls) and nanoscrolls homogeneously distributed over a silicon substrate with a predominantly vertical orientation of graphene sheets to the substrate surface. TiO2 and Al2O3 layers, with thicknesses in the range of 50 to 250 nm, were deposited on NG films by ALD. The obtained NG-MO composite materials were characterized by scanning electron microscopy, energy dispersive x-ray analysis, and Raman spectroscopy. It was found that ALD forms a uniform coating on graphene flakes, while on the surface of needle-like nanoscrolls it forms spherical nanoparticles. Field emission properties of the films were measured in a flat vacuum diode configuration. Analysis based on obtained current–voltage characteristics and electrostatic calculations show that emission from NG-TiO2 films is determined by the nanoscrolls protruding from the TiO2 coverage. The TiO2 layers with thicknesses of <200nm almost do not affect the overall field emission characteristics of the films. At the same time, these layers are able to stabilize the NG films’ surface and can lead to an improvement of the NG cold cathode performance in vacuum electronics.

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© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Victor I. Kleshch ; Rinat R. Ismagilov ; Elena A. Smolnikova ; Ekaterina A. Obraztsova ; Feruza Tuyakova, et al.
"Atomic layer deposition of TiO2 and Al2O3 on nanographite films: structure and field emission properties", J. Nanophoton. 10(1), 012509 (Nov 05, 2015). ; http://dx.doi.org/10.1117/1.JNP.10.012509


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