Atomic layer deposition of TiO2 and Al2O3 on nanographite films: structure and field emission properties

Victor I. Kleshch; Rinat R. Ismagilov; Elena A. Smolnikova; Ekaterina A. Obraztsova; Feruza Tuyakova; Alexander N. Obraztsov

doi:10.1117/1.JNP.10.012509

5 November 2015 Atomic layer deposition of TiO₂ and Al₂O₃ on nanographite films: structure and field emission properties

Victor I. Kleshch, Rinat R. Ismagilov, Elena A. Smolnikova, Ekaterina A. Obraztsova, Feruza Tuyakova, Alexander N. Obraztsov

Author Affiliations +

Journal of Nanophotonics, Vol. 10, Issue 1, 012509 (November 2015). https://doi.org/10.1117/1.JNP.10.012509

Abstract

Atomic layer deposition (ALD) of metal oxides (MO) was used to modify the properties of nanographite (NG) films produced by direct current plasma–enhanced chemical vapor deposition technique. NG films consist of a few layers of graphene flakes (nanowalls) and nanoscrolls homogeneously distributed over a silicon substrate with a predominantly vertical orientation of graphene sheets to the substrate surface. TiO₂ and Al₂O₃ layers, with thicknesses in the range of 50 to 250 nm, were deposited on NG films by ALD. The obtained NG-MO composite materials were characterized by scanning electron microscopy, energy dispersive x-ray analysis, and Raman spectroscopy. It was found that ALD forms a uniform coating on graphene flakes, while on the surface of needle-like nanoscrolls it forms spherical nanoparticles. Field emission properties of the films were measured in a flat vacuum diode configuration. Analysis based on obtained current–voltage characteristics and electrostatic calculations show that emission from NG-TiO₂ films is determined by the nanoscrolls protruding from the TiO₂ coverage. The TiO₂ layers with thicknesses of <200 nm almost do not affect the overall field emission characteristics of the films. At the same time, these layers are able to stabilize the NG films’ surface and can lead to an improvement of the NG cold cathode performance in vacuum electronics.

Citation Download Citation

Victor I. Kleshch, Rinat R. Ismagilov, Elena A. Smolnikova, Ekaterina A. Obraztsova, Feruza Tuyakova, and Alexander N. Obraztsov "Atomic layer deposition of TiO₂ and Al₂O₃ on nanographite films: structure and field emission properties," Journal of Nanophotonics 10(1), 012509 (5 November 2015). https://doi.org/10.1117/1.JNP.10.012509

Published: 5 November 2015

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available