Special Section on Advances in Nanostructured Thin Films

Pulsed laser interference patterning of polyimide grating for dye-doped polymer laser

[+] Author Affiliations
Soon Yie Kok, Teck Yong Tou, Seong Shan Yap

Multimedia University, Faculty of Engineering, Jalan Multimedia, 63100 Cyberjaya, Selangor, Malaysia

Seong Ling Yap

University of Malaya, Department of Physics, Faculty of Science, Lembah Panta, 50603 Kuala Lumpur, Malaysia

J. Nanophoton. 10(3), 033003 (Feb 08, 2016). doi:10.1117/1.JNP.10.033003
History: Received November 1, 2015; Accepted January 13, 2016
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Abstract.  Direct laser interference patterning of polyimide (PI) films was performed by using a pulsed 355-nm laser. At laser fluence of 0.4  J/cm2, gratings with spatial periods of 3.8  μm to 344 nm were created. The highest aspect ratio of the grating structure (0.8) was obtained for the 344-nm grating. An all-polymer dye laser was then fabricated by spin-coating a layer of disodium fluorescein (DF)-doped polyvinyl alcohol (PVA) film on bare and patterned PI substrate. Green laser emission was obtained when transversely pumped by a 355-nm laser. The lasing threshold reduced by 10 times for the sample with 344-nm grating while the laser intensity was 18 times higher. The enhancements are ascribed to the 344-nm grating structures, which act as an efficient distributed feedback resonator and distributed Bragg reflector grating for DF-doped PVA emitting at 563  nm, on top of being a passive light-trapping structures.

Figures in this Article
© 2016 Society of Photo-Optical Instrumentation Engineers

Topics

Lasers ; Polymers

Citation

Soon Yie Kok ; Teck Yong Tou ; Seong Ling Yap and Seong Shan Yap
"Pulsed laser interference patterning of polyimide grating for dye-doped polymer laser", J. Nanophoton. 10(3), 033003 (Feb 08, 2016). ; http://dx.doi.org/10.1117/1.JNP.10.033003


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