Research Papers

Fabrication of optical ridge waveguide in lithium niobate by argon sputtering and titanium self-alignment in-diffusion

[+] Author Affiliations
Hadi Dehghan Nayeri, Reza Asadi

Malek Ashtar University, Department of Electronics, Shabanloo Street, Lavizan, Tehran, Tehran Province, Iran

Mohammad Malekmohammad

University of Isfahan, Department of Physics, Faculty of Science, Hezar Jerib Street, Isfahan 81764-73441, Iran

J. Nanophoton. 10(3), 036016 (Sep 16, 2016). doi:10.1117/1.JNP.10.036016
History: Received June 11, 2016; Accepted August 30, 2016
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Abstract.  We report a simple way of etching lithium niobate (LN) to build ridge waveguides. Argon plasma is used in an RF-sputtering chamber to etch the LN. The height of waveguide walls reaches 2.5  μm and a titanium self-alignment in-diffusion process is used to make the waveguide. Several diffusion times and different waveguides width are used to compare the mode properties and proportion of light that is confined in the ridge section of the waveguide.

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© 2016 Society of Photo-Optical Instrumentation Engineers

Citation

Hadi Dehghan Nayeri ; Reza Asadi and Mohammad Malekmohammad
"Fabrication of optical ridge waveguide in lithium niobate by argon sputtering and titanium self-alignment in-diffusion", J. Nanophoton. 10(3), 036016 (Sep 16, 2016). ; http://dx.doi.org/10.1117/1.JNP.10.036016


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