Research Papers

Analysis of Ag nanoparticle resist in fabrication of transmission-enhanced subwavelength structures

[+] Author Affiliations
Xiangdong Kong

Changchun University of Science and Technology, Optical and Electronic Engineering, No. 7186, Weixing Road, Changchun, Jilin 130022, China

Chinese Academy of Sciences, Chongqing Institute of Green and Intelligent Technology, Key Laboratory of Multi-Scale Manufacturing Technology, No. 266, Fangzheng Road, Beibei, Chongqing 400714, China

Yuegang Fu, Lianhe Dong

Changchun University of Science and Technology, Optical and Electronic Engineering, No. 7186, Weixing Road, Changchun, Jilin 130022, China

Liangping Xia, Weiguo Zhang, Deqiang Wang, Chunlei Du

Chinese Academy of Sciences, Chongqing Institute of Green and Intelligent Technology, Key Laboratory of Multi-Scale Manufacturing Technology, No. 266, Fangzheng Road, Beibei, Chongqing 400714, China

Ziyin Zhang

Chinese Academy of Sciences, Chongqing Institute of Green and Intelligent Technology, Key Laboratory of Multi-Scale Manufacturing Technology, No. 266, Fangzheng Road, Beibei, Chongqing 400714, China

Jilin University, College of Instrumentation and Electrical Engineering, No. 938, Ximinzhu Street, Changchun, Jilin 130061, China

J. Nanophoton. 10(4), 046017 (Dec 20, 2016). doi:10.1117/1.JNP.10.046017
History: Received July 22, 2016; Accepted November 29, 2016
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Abstract.  A theoretical model is proposed to analyze the fabrication of metal nanopartical resist by metal nanofilm annealing, which is used in the manufacture of the transmission-enhanced subwavelength structures at the interface of the optical glass. Based on the conservation of volume of the metal before annealing and after heat treatment, the theoretical relationships of the structure parameters between the metal nanofilm and the metal nanoparticles are obtained. The experimental results coincide well with the theory model, which offers a theoretical guidance to fabricate subwavelength antireflected structures with the advantage of low cost achieved through metal nanofilm annealing. By this means, the average transmission of the quartz device intensifies to 97.9% for the structures fabricated on the both sides compared with the 93% for the unstructured one.

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© 2016 Society of Photo-Optical Instrumentation Engineers

Citation

Xiangdong Kong ; Yuegang Fu ; Liangping Xia ; Weiguo Zhang ; Ziyin Zhang, et al.
"Analysis of Ag nanoparticle resist in fabrication of transmission-enhanced subwavelength structures", J. Nanophoton. 10(4), 046017 (Dec 20, 2016). ; http://dx.doi.org/10.1117/1.JNP.10.046017


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