Special Section on Quantum Dots

Nanoscale selective growth and optical characteristics of quantum dots on III-V substrates prepared by diblock copolymer nanopatterning

[+] Author Affiliations
Joo Hyung Park

Department of Electrical and Computer Engineering, University of Wisconsin - Madison, 1415 Engineering Drive, Madison, WI 53706-1691

Chi-Chun Liu, Manish K. Rathi

Department of Chemical and Biological Engineering, University of Wisconsin - Madison, 1415 Engineering Dr., Madison, Wisconsin 53706

Luke J. Mawst

Department of Electrical and Computer Engineering, University of Wisconsin - Madison, 1415 Engineering Drive, Madison, WI 53706-1691

Paul F. Nealey, Thomas F. Kuech

Department of Chemical and Biological Engineering, University of Wisconsin - Madison, 1415 Engineering Dr., Madison, Wisconsin 53706

J. Nanophoton. 3(1), 031604 (January 30, 2009). doi:10.1117/1.3085990
History: Received September 1, 2008; Revised December 2, 2008; Accepted December 2, 2008; January 30, 2009; Online January 30, 2009
Text Size: A A A

Abstract

As an alternate Quantum Dot (QD) fabrication method to self-assembled SK mode QDs, diblock copolymer nano-patterned QDs were investigated. By employing selective growth of QDs on diblock copolymer nano-patterned masks, independence from the problematic wetting layer and controllability on QD size and distribution associated with SK growth mode QDs were realized. The diblock copolymer nano-patterned masks were fabricated using a diblock copolymer template and a dielectric mask, and InxGa1-xAs QDs were selectively grown on patterned GaAs and InP substrates by Metalorganic Chemical Vapor Deposition (MOCVD). The optical properties from diblock copolymer patterned QDs on III-V substrates were investigated at low temperature.

© 2009 Society of Photo-Optical Instrumentation Engineers

Citation

Joo Hyung Park ; Chi-Chun Liu ; Manish K. Rathi ; Luke J. Mawst ; Paul F. Nealey, et al.
"Nanoscale selective growth and optical characteristics of quantum dots on III-V substrates prepared by diblock copolymer nanopatterning", J. Nanophoton. 3(1), 031604 (January 30, 2009). ; http://dx.doi.org/10.1117/1.3085990


Figures

Tables

Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

PubMed Articles
Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.