Presentation
5 March 2021 Evolution of the optical properties in atomically thin plasmonic titanium nitride
Deesha Shah, Vladimir M. Shalaev, Alexandra Boltasseva
Author Affiliations +
Abstract
In this study, we present a joint theoretical and experimental study on the dielectric permittivity of ultra-thin TiN films of varying thicknesses. We perform both ex situ and in situ ellipsometry to decouple the effects of thickness and oxidation. Our results indicate a remarkably persistent plasmonic character as the thickness is reduced. The effects of thickness and oxidation on their plasmonic properties are analyzed as fundamental parameters to optimize the optical response. Atomically thin plasmonic materials display great potential for the realization of tailorable and dynamically tunable metasurfaces because of their large sensitivity to structural parameters and external perturbations.
Conference Presentation
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Deesha Shah, Vladimir M. Shalaev, and Alexandra Boltasseva "Evolution of the optical properties in atomically thin plasmonic titanium nitride", Proc. SPIE 11682, Optical Components and Materials XVIII, 1168212 (5 March 2021); https://doi.org/10.1117/12.2577734
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KEYWORDS
Optical properties

Plasmonics

Tin

Titanium

Thin films

In situ metrology

Sputter deposition

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