Presentation + Paper
23 August 2021 The effect of deposition process parameters on thin film coatings for the Athena X-ray optics
S. Massahi, D. Ferreira, F. Christensen, N. Gellert, S. Svendsen, P. Henriksen, A. 'S Jegers, M. Collon, B. Landgraf, D. Girou, A. Thete, B. Shortt, I. Ferreira, M. Bavdaz, W. Schönberger, A. Langer
Author Affiliations +
Abstract
The thin film coating technology for the European Space Agency mission, Advanced Telescope for High-Energy Astrophysics (Athena) has been established. The X-ray optics of the Athena telescope is based on Silicon Pore Optics (SPO) technology which is enhanced by the thin film coatings deposited on the reflective surface of the SPO plates. In this work, we present a literature study of the coating process parameter space and provide an overview of the thin film properties with a focus on micro roughness, chemical composition and wear resistance when deposited under various process conditions. We determined, that the thin film density depends strongly on the mobility of the adatoms on the substrate surface. Some coating process parameters, which have a significant impact on the adatom mobility are the discharge voltage, the working gas pressure and the substrate temperature.
Conference Presentation
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S. Massahi, D. Ferreira, F. Christensen, N. Gellert, S. Svendsen, P. Henriksen, A. 'S Jegers, M. Collon, B. Landgraf, D. Girou, A. Thete, B. Shortt, I. Ferreira, M. Bavdaz, W. Schönberger, and A. Langer "The effect of deposition process parameters on thin film coatings for the Athena X-ray optics", Proc. SPIE 11822, Optics for EUV, X-Ray, and Gamma-Ray Astronomy X, 118220B (23 August 2021); https://doi.org/10.1117/12.2594422
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Thin film coatings

Coating

Argon

Plasma

Thin films

Chemical species

Deposition processes

Back to Top