Analysis and simulation of spatial phase alignment for fabrication of double-layer grating

Shuonan Shan; Tianshi Lu; Fuyuang Deng; Xiaohao Wang; Xinghui Li

doi:10.1117/12.2691160

28 November 2023 Analysis and simulation of spatial phase alignment for fabrication of double-layer grating

Shuonan Shan, Tianshi Lu, Fuyuang Deng, Xiaohao Wang, Xinghui Li

Proceedings Volume 12765, Optical Design and Testing XIII; 1276524 (2023) https://doi.org/10.1117/12.2691160
Event: SPIE/COS Photonics Asia, 2023, Beijing, China

Conference Poster

Abstract

During the chip manufacturing process, meeting overlay error requirements is essential to semiconductor yield. Measuring equipment of overlay error requires standard samples, which the double-layer grating with precise horizontal alignment can be used as, to verify its capability. Thus, we propose a novel alignment and processing method for layer separated processed double-layer gratings. Firstly, the bottom grating is obtained by holographic lithography . The upper and lower layers are aligned based on the homogeneous period of processing diffraction patten and the bottom grating, and manufactured simultaneously. We conducted an optical simulation of the alignment based on FDTD, setting the bottom grating as Ag material, 50 nm depth, 1μm period, and 50% duty cycle. Principally, the alignment accuracy is comparable with the linear encoder.

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Shuonan Shan, Tianshi Lu, Fuyuang Deng, Xiaohao Wang, and Xinghui Li "Analysis and simulation of spatial phase alignment for fabrication of double-layer grating", Proc. SPIE 12765, Optical Design and Testing XIII, 1276524 (28 November 2023); https://doi.org/10.1117/12.2691160

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