Paper
1 August 1990 Study of GaAs/AlGaAs and InGaAs/InP quantum well structures using low-field transverse electroreflectance
Harri K. Lipsanen, Veli-Matti Airaksinen, Turkka O. Tuomi, P. A. Claxton
Author Affiliations +
Proceedings Volume 1286, Modulation Spectroscopy; (1990) https://doi.org/10.1117/12.20858
Event: Advances in Semiconductors and Superconductors: Physics Toward Devices Applications, 1990, San Diego, CA, United States
Abstract
We have employed the transverse electroreflectance technique to characterize multiple quantum well structures. A weak modulating electric field (1-100 V/cm) was applied transversally to the probe light beam, i.e., parallel to the quantum well layers. Photoreflectance and in-plane photoconductivity spectra can also be measured with this configuration. The transition energies measured were closely the same as those obtained from the photoreflectance and Schottky barrier electroreflectance spectra. The method can be applied for relatively highly resistive undoped layers grown on semi-insulating substrates. The modulation mechanism in transverse electroreflectance is not well understood.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Harri K. Lipsanen, Veli-Matti Airaksinen, Turkka O. Tuomi, and P. A. Claxton "Study of GaAs/AlGaAs and InGaAs/InP quantum well structures using low-field transverse electroreflectance", Proc. SPIE 1286, Modulation Spectroscopy, (1 August 1990); https://doi.org/10.1117/12.20858
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Modulation

Quantum wells

Gallium arsenide

Spectroscopy

Temperature metrology

Laser beam diagnostics

Resistance

Back to Top