MetaMode: a new method for high-rate MetaMode reactive sputtering

Richard Ian Seddon; Paul M. Lefebvre

doi:10.1117/12.22379

1 December 1990 MetaMode: a new method for high-rate MetaMode reactive sputtering

Richard Ian Seddon, Paul M. Lefebvre

Proceedings Volume 1323, Optical Thin Films III: New Developments; (1990) https://doi.org/10.1117/12.22379
Event: 34th Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1990, San Diego, CA, United States

Abstract

A new system has been developed.for DC reactive magnetron sputtering. This system features enhanced oxidation rates and near metallic sputtering conditions. It is particularly well adapted for coating complex multilayer films and for depositing uniform thickness films on small to moderate size planar and nonplanar substrates.

Citation Download Citation

Richard Ian Seddon and Paul M. Lefebvre "MetaMode: a new method for high-rate MetaMode reactive sputtering", Proc. SPIE 1323, Optical Thin Films III: New Developments, (1 December 1990); https://doi.org/10.1117/12.22379

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