IC rewiring by laser microchemistry

Gerard Pelous; Yves Guern; D. Gobleid; J. David; A. Chion; Didier Tonneau

doi:10.1117/12.51036

1 December 1991 IC rewiring by laser microchemistry

Gerard Pelous, Yves Guern, D. Gobleid, J. David, A. Chion, Didier Tonneau

Proceedings Volume 1598, Lasers in Microelectronic Manufacturing; (1991) https://doi.org/10.1117/12.51036
Event: Microelectronic Processing Integration, 1991, San Jose, CA, United States

Abstract

ICs interconnection networks can be locally modified using a tightly focused laser beam to induce chemical reactions on the circuit surface. Owing to the precursor used, conductors and insulators can either be etched or deposited within the laser spot. Bertin & Co. have recently developed a line of laser-assisted tools dedicated to VLSI prototypes rewiring. This paper summarizes the tests performed on various technology devices from major IC manufacturers: IBM, STM, and Texas Instruments. The different repair steps and results of the characterization tests are presented.

Citation Download Citation

Gerard Pelous, Yves Guern, D. Gobleid, J. David, A. Chion, and Didier Tonneau "IC rewiring by laser microchemistry", Proc. SPIE 1598, Lasers in Microelectronic Manufacturing, (1 December 1991); https://doi.org/10.1117/12.51036

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