Novel spacer technique by silylation: experiment and simulation

Ulrich A. Jagdhold; Lothar Bauch; A. Wolff; Joachim J. Bauer

doi:10.1117/12.175361

16 May 1994 Novel spacer technique by silylation: experiment and simulation

Ulrich A. Jagdhold, Lothar Bauch, A. Wolff, Joachim J. Bauer

Proceedings Volume 2195, Advances in Resist Technology and Processing XI; (1994) https://doi.org/10.1117/12.175361
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

A new advanced process scheme is presented using a self aligned sidewall oxide film formation. The process technique was evaluated with simulation methods. During the experiments a new effect, the selective silylation, was found.

Citation Download Citation

Ulrich A. Jagdhold, Lothar Bauch, A. Wolff, and Joachim J. Bauer "Novel spacer technique by silylation: experiment and simulation", Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); https://doi.org/10.1117/12.175361

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