Surface profile measurement of thin film using phase-shifting interferometry

Yiping Xu; Yuanjing Li

doi:10.1117/12.212652

23 June 1995 Surface profile measurement of thin film using phase-shifting interferometry

Yiping Xu, Yuanjing Li

Proceedings Volume 2545, Interferometry VII: Applications; (1995) https://doi.org/10.1117/12.212652
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

Current optical interferometric methods for reconstructing 3D surface profiles of thin films from phase measurements are often inaccurate because of the effects of phase changes on reflection. A new method has been developed that automatically determines the film thickness and reconstructs the surface profile of thin films from conventional interferometric phase measurements. This method uses known optical constants of the materials that compose the test surface. By measuring the film thickness at each point of the test surface, a 3D surface profile can be reconstructed. Experimental results are presented for a set of thin film standards consisting of SiO₂ film on silicon substrate. The thin film thickness determined using this method is within the uncertainty certified by the standard manufacturer.

Citation Download Citation

Yiping Xu and Yuanjing Li "Surface profile measurement of thin film using phase-shifting interferometry", Proc. SPIE 2545, Interferometry VII: Applications, (23 June 1995); https://doi.org/10.1117/12.212652

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