Contamination control for ultrapure chemicals from microelectronics fab

Dumitru Gh. Ulieru

doi:10.1117/12.221319

19 September 1995 Contamination control for ultrapure chemicals from microelectronics fab

Dumitru Gh. Ulieru

Proceedings Volume 2637, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing; (1995) https://doi.org/10.1117/12.221319
Event: Microelectronic Manufacturing '95, 1995, Austin, TX, United States

Abstract

In this paper it is described the techniques and results for contamination control of process chemicals. Two distinct analytical problems are studied: The first concerns the analysis methods of dissolved and insoluble impurities, with the second concerns the analysis of particulate matter separated from the solutions by ultrafiltration techniques to 0.2 microns. The results suggest that considerable quantities of insoluble metallic impurities can be present in semiconductor grade chemicals and that they can be removed by ultrafiltration techniques. In our study we are concerned with the met processing stage including the quality of the chemicals used for developing, reusing, etching, and cleaning procedures in photolithographic processing. In our experience the pure chemical contain considerable quantities of particulate matter. In MOS integrated circuit technologies where the electrical functioning of the devices is surface dependence, the presence of small quantities of specific impurities is even more critical. In order to determinate the quantitive levels of dissolved and particulate impurities present in semiconductor processing chemicals three methods were chosen for their sensitivity and simplicity: (1) Activation analysis, (2) Flamless atomic absorption, and (3) X-ray fluorescence.

Citation Download Citation

Dumitru Gh. Ulieru "Contamination control for ultrapure chemicals from microelectronics fab", Proc. SPIE 2637, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing, (19 September 1995); https://doi.org/10.1117/12.221319

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
8 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Chemical analysis

Sodium

Semiconductors

Chromium

Manganese

Particles

Silver

Show All Keywords

Keywords/Phrases

Search In:

Publication Years