Paper
13 September 1996 Grating-based surface-normal optoelectronic interconnects on Si substrate
Feiming Li, Michael Dubinovsky, Oleg A. Ershov, Linghui Wu, Ting Li, Suning Tang, Ray T. Chen
Author Affiliations +
Abstract
We report in this paper the surface-normal input and output grating couplers for 1-to-many fanouts aiming at optical clock signal distribution application. For wafer-scale interconnects, surface-relief polygonal gratings with a 1 micrometer period (0.5 micrometer feature size) were fabricated using reactive ion beam etching (RIE). Surface- normal input and output coupling schemes were carried out with a combined coupling efficiency of 65%. Employment of substrate modes in silicon greatly releases the required grating spacing for the demonstrated two-way surface-normal coupling. Seven and five-tenths GHz 1-to-4 clock signal distribution operating at 1.3 micrometer was demonstrated with a signal to noise ratio as high as 60 dB. Generalization of 1-to-many fanout can be realized by implementing a polygonal grating with an equivalent number of facets. For board level optical clock signal distribution system, a preliminary result using a parallelogramic grating to couple surface-normal input light into polyimide waveguide is also reported.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Feiming Li, Michael Dubinovsky, Oleg A. Ershov, Linghui Wu, Ting Li, Suning Tang, and Ray T. Chen "Grating-based surface-normal optoelectronic interconnects on Si substrate", Proc. SPIE 2877, Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing III, (13 September 1996); https://doi.org/10.1117/12.250925
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KEYWORDS
Diffraction gratings

Waveguides

Silicon

Reactive ion etching

Clocks

Optical clocks

Diffraction

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