Development of advanced ArF resist using alicyclic methacrylate copolymer: the optimum quenchers for this copolymer

Yukiya Wakisaka; Tadayuki Fujiwara; Masayuki Tooyama; Hideaki Kuwano; Koji Nishida

doi:10.1117/12.388272

23 June 2000 Development of advanced ArF resist using alicyclic methacrylate copolymer: the optimum quenchers for this copolymer

Yukiya Wakisaka, Tadayuki Fujiwara, Masayuki Tooyama, Hideaki Kuwano, Koji Nishida

Author Affiliations +

Proceedings Volume 3999, Advances in Resist Technology and Processing XVII; (2000) https://doi.org/10.1117/12.388272
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

We have investigated alicyclic methacrylate copolymers for positive ArF resist. The resist utilizing developed copolymer had so high sensitivity and so high resolution that we could believe its potentiality to be high. When any quenchers were not added, the limited resolution of the developed resist was by 0.14 micrometer L/S. Therefore we carried out the investigation of quencher in order to improve the resolution of the resist. As a result, it found out that amide compounds were effective as a quencher for this system, and a certain kind of an amide compound made the resist profiles good. Then we studied the relationship between the resist performance and the basicity or the polarity of the basic organic compounds used as quencher.

Citation Download Citation

Yukiya Wakisaka, Tadayuki Fujiwara, Masayuki Tooyama, Hideaki Kuwano, and Koji Nishida "Development of advanced ArF resist using alicyclic methacrylate copolymer: the optimum quenchers for this copolymer", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); https://doi.org/10.1117/12.388272

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