Pulsed-laser ablation vs. pulsed ion beam evaporation for applications to materials science

Kiyoshi Yatsui; Makoto Hirai; K. Kitajima; Takanori Suzuki; Weihua Jiang

doi:10.1117/12.431219

26 June 2001 Pulsed-laser ablation vs. pulsed ion beam evaporation for applications to materials science

Kiyoshi Yatsui, Makoto Hirai, K. Kitajima, Takanori Suzuki, Weihua Jiang

Proceedings Volume 4423, Nonresonant Laser-Matter Interaction (NLMI-10); (2001) https://doi.org/10.1117/12.431219
Event: Nonresonant Laser-Matter Interaction (NLMI-10), 2000, St. Petersburg, Russian Federation

Abstract

Applications of ablation plasma to materials science have been carried out using pulsed laser ablation and pulsed ion beam evaporation. Although basic idea is similar each other, the energy absorption mechanism of the two processes differs a lot, yielding big difference such as in the preparation of thin films. Compared with the pulsed laser ablation, the pulsed ion beam ablation has an advantage of higher plasma density inherent to huge energy density on targets. Two examples will be shown for the preparation of hard films, for example films by pulsed laser ablation and B₄C films by pulsed ion beam evaporation.

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Kiyoshi Yatsui, Makoto Hirai, K. Kitajima, Takanori Suzuki, and Weihua Jiang "Pulsed-laser ablation vs. pulsed ion beam evaporation for applications to materials science", Proc. SPIE 4423, Nonresonant Laser-Matter Interaction (NLMI-10), (26 June 2001); https://doi.org/10.1117/12.431219

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KEYWORDS

Plasma

Ion beams

Laser ablation

Thin films

Aluminum

Chromium

Absorption

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