The challenge of nanometrology

Michael T. Postek Jr.

doi:10.1117/12.427107

24 July 2002 The challenge of nanometrology

Michael T. Postek Jr.

Author Affiliations +

Proceedings Volume 4608, Nanostructure Science, Metrology, and Technology; (2002) https://doi.org/10.1117/12.427107
Event: Workshop on Nanostructure Science, Metrology, and Technology, 2001, Gaithersburg, MD, United States

Abstract

The promise and challenge of nanotechnology is immense. The National Nanotechnology Initiative provides an opportunity to develop a new technological base for U.S. Industry. Nanometrology is the basis of the new measurement methods that must be developed to support the nanotechnology. Nanometrology has played a key role in support for the semiconductor and other U.S. industries already developing products with nanometer-sized dimensions. Nanometrology techniques, standards and infrastructure development are needed to control fabrication and production, ensure product quality, and enable different parts to work effectively together. Size and tolerance are important considerations and require standardization. Metrology is critical to developing a complete understanding of any new phenomenon or process. Only those things that can be measured can be fully understood. Ultimately, this understanding is critical to obtaining the immense economic benefits predicted by the National Nanotechnology Initiative for U. S. industry.

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Michael T. Postek Jr. "The challenge of nanometrology", Proc. SPIE 4608, Nanostructure Science, Metrology, and Technology, (24 July 2002); https://doi.org/10.1117/12.427107

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KEYWORDS

Metrology

Nanotechnology

Standards development

Semiconductors

Manufacturing

Scanning electron microscopy

X-rays

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