Laser deposition of amorphous diamond thin films assisted by O plasma

Yuhua Li; Wenjie Guan; Weiling Huang

doi:10.1117/12.482890

12 September 2002 Laser deposition of amorphous diamond thin films assisted by O plasma

Yuhua Li, Wenjie Guan, Weiling Huang

Proceedings Volume 4915, Lasers in Material Processing and Manufacturing; (2002) https://doi.org/10.1117/12.482890
Event: Photonics Asia, 2002, Shanghai, China

Abstract

Amorphous diamond thin films have been deposited by pulsed excimer laser (XECL 308nm, 23ns, 300mj) and eched by O plasma. The films were studied with CCD microscopy, SEM, Raman spectroscopy. The films showed an increased surface particle density, a decreased optical transparency, as well as a higher sp3 content. The plasma particle have more higher energy and the duration is very short, so the plasma flux is intensive and this is suitable to deposit amorphous thin films and other metestable material. The role of O plasma have concluded, the characteristic of graphite to diamond have been discussed.

Citation Download Citation

Yuhua Li, Wenjie Guan, and Weiling Huang "Laser deposition of amorphous diamond thin films assisted by O plasma", Proc. SPIE 4915, Lasers in Material Processing and Manufacturing, (12 September 2002); https://doi.org/10.1117/12.482890

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