Optimized ablation condition to prepare polyperinaphthalene thin films using the third harmonic wavelength of Nd:YAG laser

Satoru Nishio; Chihiro Kanezawa; Hiroshi Fukumura

doi:10.1117/12.540530

18 November 2003 Optimized ablation condition to prepare polyperinaphthalene thin films using the third harmonic wavelength of Nd:YAG laser

Satoru Nishio, Chihiro Kanezawa, Hiroshi Fukumura

Author Affiliations +

Proceedings Volume 5063, Fourth International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.540530
Event: Fourth International Symposium on Laser Precision Microfabrication, 2003, Munich, Germany

Abstract

Ablation of mixture targets of perylenetetracarboxylic dianhydride (PTCDA) with cobalt powder is carried out using the third harmonic of a Nd:YAG laser to obtain thin films consisting of variety size of nanoparticles. FT-IR and Raman spectroscopic studies allow us to conclude that fragments without the anhydride groups of PTCDA and with better defined perylene skeleton are deposited on the substrates. Gradual increase of the electric conductivity with increasing substrate temperature during deposition suggests effective polymerization of the deposit to form polyperinaphthalene (PPN), one of low dimensional graphite family. Furthermore a Raman spectrum for each nanoparticle prepared by laser ablation at a fluence of 0.5 Jcm^-2pulse^-1 is successfully measured by the surface enhanced Raman spectroscopy (SERS) with a silicon tip for atomic force microscopy (AFM) coated with gold.

Citation Download Citation

Satoru Nishio, Chihiro Kanezawa, and Hiroshi Fukumura "Optimized ablation condition to prepare polyperinaphthalene thin films using the third harmonic wavelength of Nd:YAG laser", Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); https://doi.org/10.1117/12.540530

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