Comparison of silicon oxide films deposited by RF ion beam sputtering and e-beam gun evaporation in visible to UV ranges

Jean-Yee Wu; Cheng-Chung Lee

doi:10.1117/12.615822

19 August 2005 Comparison of silicon oxide films deposited by RF ion beam sputtering and e-beam gun evaporation in visible to UV ranges

Jean-Yee Wu, Cheng-Chung Lee

Author Affiliations +

Proceedings Volume 5870, Advances in Thin-Film Coatings for Optical Applications II; 58700G (2005) https://doi.org/10.1117/12.615822
Event: Optics and Photonics 2005, 2005, San Diego, California, United States

Abstract

Silicon oxide thin films were deposited by RF ion beam sputtering and E-beam gun evaporation from two different starting materials, silicon and silica. The properties were studied by using the UV-Visible spectrometer, Fourier transform infrared spectrometer (FTIR) and atomic force microscopy (AFM). The refractive indices, extinction coefficients, surface roughness and molecular bonding structure of these films were discussed for visible to UV range application.

Citation Download Citation

Jean-Yee Wu and Cheng-Chung Lee "Comparison of silicon oxide films deposited by RF ion beam sputtering and e-beam gun evaporation in visible to UV ranges", Proc. SPIE 5870, Advances in Thin-Film Coatings for Optical Applications II, 58700G (19 August 2005); https://doi.org/10.1117/12.615822

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