Evaluation of mask data format standard OASIS.MASK developed for mask tools

Toshio Suzuki; Yoshinori Nagaoka; Yumiko Maenaka; Venu Vellanki; Wayne Ruch; Masayoshi Mori; Keiko Hattori; Kunihiro Hosono; Shogo Narukawa; Morihisa Hoga; Hiroshi Mohri

doi:10.1117/12.824351

11 May 2009 Evaluation of mask data format standard OASIS.MASK developed for mask tools

Toshio Suzuki, Yoshinori Nagaoka, Yumiko Maenaka, Venu Vellanki, Wayne Ruch, Masayoshi Mori, Keiko Hattori, Kunihiro Hosono, Shogo Narukawa, Morihisa Hoga, Hiroshi Mohri

Author Affiliations +

Proceedings Volume 7379, Photomask and Next-Generation Lithography Mask Technology XVI; 737931 (2009) https://doi.org/10.1117/12.824351
Event: Photomask and NGL Mask Technology XVI, 2009, Yokohama, Japan

Abstract

We have evaluated a unified mask pattern data format named "OASIS.MASK"1 and a unified job deck format named "MALY"² for mask tools as the input data formats of the inspection tool using the mask data and the photomask produced with the 65nm design rule. The data conversion time and the data volume for the inspection data files were evaluated by comparing with the results for using the native EB data and the native job deck data. The inspection speed and the defect number of the inspection tool were also evaluated with the actual inspection tool. We have confirmed that there is no large issue in applying OASIS.MASK and MALY to the input data formats of the inspection tool and they can become the common intermediate format in our MDP flow. The detail of evaluation results will be mainly introduced in this paper.

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Toshio Suzuki, Yoshinori Nagaoka, Yumiko Maenaka, Venu Vellanki, Wayne Ruch, Masayoshi Mori, Keiko Hattori, Kunihiro Hosono, Shogo Narukawa, Morihisa Hoga, and Hiroshi Mohri "Evaluation of mask data format standard OASIS.MASK developed for mask tools", Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 737931 (11 May 2009); https://doi.org/10.1117/12.824351

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