Paper
18 February 2011 Nanometer gap detection method using GMR grating
Zihuan Xia, Yonggang Wu, Leijie Ling, Gang Lv, Heyun Wu
Author Affiliations +
Proceedings Volume 7995, Seventh International Conference on Thin Film Physics and Applications; 79952N (2011) https://doi.org/10.1117/12.887554
Event: Seventh International Conference on Thin Film Physics and Applications, 2010, Shanghai, China
Abstract
In this paper the displacement of the reflection resonant peak resulting from the change of the gap between the guided-mode resonance (GMR) grating and substrate is used to measure the nanometer gap. The paper calculates double layer model and metal substrate model using rigorous coupled-wave analysis (RCWA). It is revealed that nano-gap detection using GMR grating is feasible for both dielectric and metal substrate. The detection range of resonant wavelength and gap is tunable. The detect sensitivity is investigated by varying the parameters of grating (thickness, period and refractive index), the thickness of films, and polarization. Tolerance of grating implies an advantage for manufacture. An optimized result presents an 18nm resonant shift for 100nm gap with the max sensitivity achieving 0.85.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zihuan Xia, Yonggang Wu, Leijie Ling, Gang Lv, and Heyun Wu "Nanometer gap detection method using GMR grating", Proc. SPIE 7995, Seventh International Conference on Thin Film Physics and Applications, 79952N (18 February 2011); https://doi.org/10.1117/12.887554
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KEYWORDS
Metals

Waveguides

Dielectric polarization

Refractive index

Manufacturing

Reflection

Diffraction gratings

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