Contact hole shrink process using directed self-assembly

Yuriko Seino; Hiroki Yonemitsu; Hironobu Sato; Masahiro Kanno; Hikazu Kato; Katsutoshi Kobayashi; Ayako Kawanishi; Tsukasa Azuma; Makoto Muramatsu; Seiji Nagahara; Takahiro Kitano; Takayuki Toshima

doi:10.1117/12.915652

21 March 2012 Contact hole shrink process using directed self-assembly

Yuriko Seino, Hiroki Yonemitsu, Hironobu Sato, Masahiro Kanno, Hikazu Kato, Katsutoshi Kobayashi, Ayako Kawanishi, Tsukasa Azuma, Makoto Muramatsu, Seiji Nagahara, Takahiro Kitano, Takayuki Toshima

Author Affiliations +

Proceedings Volume 8323, Alternative Lithographic Technologies IV; 83230Y (2012) https://doi.org/10.1117/12.915652
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

We report on a contact hole shrink process using directed self-assembly. A diblock copolymer, poly (styrene-blockmethyl methacrylate) (PS-b-PMMA), is used to shrink contact holes. Contact hole guide patterns for graphoepitaxy are formed by ArF photoresists. Cylindrical domains of PMMA is removed using organic solvents after DUV (λ <200 nm) irradiation. In this work, it is found that a solvent system is the best developer from the evaluated single solvent systems and mixed solvent systems. The wet development of PS-b-PMMA strongly depends on total exposure dose of DUV irradiation. With lower exposure dose, the cylindrical domains of PMMA are not clearly removed. With optimum exposure dose, PMMA is developed clearly. The contact hole guide patterns of 75 nm in diameter are successfully shrunk to 20 nm in diameter using the wet development process.

Citation Download Citation

Yuriko Seino, Hiroki Yonemitsu, Hironobu Sato, Masahiro Kanno, Hikazu Kato, Katsutoshi Kobayashi, Ayako Kawanishi, Tsukasa Azuma, Makoto Muramatsu, Seiji Nagahara, Takahiro Kitano, and Takayuki Toshima "Contact hole shrink process using directed self-assembly", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83230Y (21 March 2012); https://doi.org/10.1117/12.915652

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available