Investigation of correlation with the octanol water partition coefficient and the sensitivity of negative-tone molecular resists

Masatoshi Echigo; Masako Yamakawa; Yumi Ochiai; Yu Okada; Masaaki Takasuka

doi:10.1117/12.916145

19 March 2012 Investigation of correlation with the octanol water partition coefficient and the sensitivity of negative-tone molecular resists

Masatoshi Echigo, Masako Yamakawa, Yumi Ochiai, Yu Okada, Masaaki Takasuka

Author Affiliations +

Proceedings Volume 8325, Advances in Resist Materials and Processing Technology XXIX; 83251G (2012) https://doi.org/10.1117/12.916145
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

In this paper, we report the investigation of correlation with the octanol water partition coefficient and the sensitivity of negative-tone molecular resists based on calix[4]resorcinarene (CRA) by Electron Beam Lithography (EBL). The sensitivity of negative-tone molecular resists were higher as the value of the Octanol water partition coefficient got smaller. It was confirmed that the octanol water partition coefficient was useful to the guess of sensitivity of negativetone molecular resists. Furthermore, we have developed calix[4]resorcinarenes showing well-defined sub 20nm halfpitch patterns.

Citation Download Citation

Masatoshi Echigo, Masako Yamakawa, Yumi Ochiai, Yu Okada, and Masaaki Takasuka "Investigation of correlation with the octanol water partition coefficient and the sensitivity of negative-tone molecular resists", Proc. SPIE 8325, Advances in Resist Materials and Processing Technology XXIX, 83251G (19 March 2012); https://doi.org/10.1117/12.916145

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