BaAl2S4:Eu thin films sputtered by complex target with spark plasma sintering BaS:Eu pellets

Dongpu Zhang; Wei Xue; Zhinong Yu

doi:10.1117/12.2001136

27 November 2012 BaAl₂S₄:Eu thin films sputtered by complex target with spark plasma sintering BaS:Eu pellets

Dongpu Zhang, Wei Xue, Zhinong Yu

Proceedings Volume 8560, LED and Display Technologies II; 85600H (2012) https://doi.org/10.1117/12.2001136
Event: Photonics Asia, 2012, Beijing, China

Abstract

Europium doping barium thioaluminates thin films are sputtered by Al complex target embedded with BaS:Eu pellets sintered by spark plasma sintering (SPS). Thin films are deposited by RF-sputtering with complex target. BaAl₂S₄ is found in each thin film sample while BaAl₄S₇ appears in the samples only if the amount of BaS:Eu pellets is more than 3. Oxidizing products are BaAl₂O_4,BaSO₄ and Al₂O₃. The amounts of barium thioaluminates including BaAl₂S₄ and BaAl₄S₇ will increase while the one of Al₂O₃ and BaS decrease if more BaS:Eu pellets are embedded in the target during sputtering. Elements analysis is carried out by EDS. The Al/Ba ratio in thin films will approach 2.0 with more pellets existing in target. PL spectra of thin films are measured and analyzed. The most obvious emission peak in each spectrum is located at about 470nm which corresponds to the 4f⁶5d¹→4f⁷ transition of Eu2+ in BaAl₂S₄ lattice. The emission peak will approach 470nm as more pellets are embedded in complex target. As a result, it can be concluded that increasing the amounts of BaS:Eu pellets in complex target is an efficient way to achieve better Eu doping barium thioaluminates thin film.

Citation Download Citation

Dongpu Zhang, Wei Xue, and Zhinong Yu "BaAl₂S₄:Eu thin films sputtered by complex target with spark plasma sintering BaS:Eu pellets", Proc. SPIE 8560, LED and Display Technologies II, 85600H (27 November 2012); https://doi.org/10.1117/12.2001136

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