Evaluating the role of photoacid generator and quencher loadings on EUV film homogeneity

Michael J. Eller; Jander Cruz; Stanislav V. Verkhoturov; Michael A. Robinson; James M. Blackwell; Emile A. Schweikert

doi:10.1117/12.2641539

11 November 2022 Evaluating the role of photoacid generator and quencher loadings on EUV film homogeneity

Michael J. Eller, Jander Cruz, Stanislav V. Verkhoturov, Michael A. Robinson, James M. Blackwell, Emile A. Schweikert

Proceedings Volume PC12292, International Conference on Extreme Ultraviolet Lithography 2022; PC122920J (2022) https://doi.org/10.1117/12.2641539
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States

Abstract

In this study we examined a series of model EUV resists with varying concentration of photoacid generator, PAG, or photodecomposable quencher, PDQ and their effects on resist uniformity using Nano-Projectile Secondary Ion Mass Spectrometry, NP-SIMS. Nanoscale analysis with NP-SIMS is achieved due three innovative features of the technique (1) the mode of data acquisition (2) method of data analysis (3) the nature of the impacting projectile. The results showed that ionic interactions between PAG and PDQ are modified due to the relative/absolute loading of the two components. These results demonstrate the NP-SIMS is a useful tool for assessing the effect of additive loadings on EUV resist uniformity at the nanoscale.

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Citation Download Citation

Michael J. Eller, Jander Cruz, Stanislav V. Verkhoturov, Michael A. Robinson, James M. Blackwell, and Emile A. Schweikert "Evaluating the role of photoacid generator and quencher loadings on EUV film homogeneity", Proc. SPIE PC12292, International Conference on Extreme Ultraviolet Lithography 2022, PC122920J (11 November 2022); https://doi.org/10.1117/12.2641539

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