Dr. Mats Ekberg
at Uppsala University
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 12 May 2005 Paper
Hans Fosshaug, Mats Ekberg, Gunnar Kylberg
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600312
KEYWORDS: Molecules, Contamination, Adsorption, Diffusion, Deep ultraviolet, Oxides, Polarizability, Absorption, Ozone, Lithography

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535767
KEYWORDS: Diffractive optical elements, Diffraction, Spatial light modulators, Manufacturing, Optics manufacturing, Phase shift keying, Quartz, Refractive index, Photomasks, Stray light

Proceedings Article | 28 May 2004 Paper
Mats Ekberg, Hans Fosshaug, Thomas Ostrom, Peter Bjornangen, Thomas Utterback, Per-Uno Skotte, John Higley, David Ruede, Oleg Kishkovich
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535833
KEYWORDS: Photomasks, Deep ultraviolet, Molecules, Chemical analysis, Climatology, Molecular lasers, Spatial light modulators, Contamination, Optical components, Contamination control

Proceedings Article | 24 May 2004 Paper
Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.535830
KEYWORDS: Reflectivity, Spatial light modulators, Optical alignment, Deep ultraviolet, Charge-coupled devices, Image quality, Quartz, CCD cameras, Autoregressive models, Antireflective coatings

Proceedings Article | 14 May 2004 Paper
Hans Fosshaug, Per Askebjer, Johan Karlsson, Adisa Bajramovic, Kezhao Xing, Robert Eklund, Jonathan Walford, Mats Ekberg, Peter Hogfeldt, Thomas Öström
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535821
KEYWORDS: Diffusion, Critical dimension metrology, Photomasks, Deep ultraviolet, Polymers, Printing, Spatial light modulators, Photoresist materials, Chemistry, Chemically amplified resists

Showing 5 of 10 publications
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