PROCEEDINGS VOLUME 11492
SPIE OPTICAL ENGINEERING + APPLICATIONS | 24 AUGUST - 4 SEPTEMBER 2020
Advances in Metrology for X-Ray and EUV Optics IX
Editor Affiliations +
Proceedings Volume 11492 is from: Logo
SPIE OPTICAL ENGINEERING + APPLICATIONS
24 August - 4 September 2020
Online Only, California, United States
Front Matter: Volume 11492
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 1149201 (2020) https://doi.org/10.1117/12.2581593
Slope Profilometry and Interferometry
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 1149203 (2020) https://doi.org/10.1117/12.2570412
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 1149204 (2020) https://doi.org/10.1117/12.2569751
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 1149205 (2020) https://doi.org/10.1117/12.2570462
Kota Hashimoto, Takeshi Ashizawa, Mikiya Ikuchi, Katsuyoshi Endo
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 1149206 (2020) https://doi.org/10.1117/12.2567841
Sub-nanometer and Nanoradian-angle Metrology Instrumentation, Methods, and Calibration
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 1149209 (2020) https://doi.org/10.1117/12.2568868
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920A https://doi.org/10.1117/12.2570370
Sub-aperture Stitching
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920B https://doi.org/10.1117/12.2567561
Qiaoyu Wu, Qiushi Huang, Yingna Shi, Xudong Xu, Runze Qi, Zhong Zhang, Yumei He, Jie Wang, Zhanshan Wang
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920C (2020) https://doi.org/10.1117/12.2567385
Metrology of Variable Line Spacing Diffraction Gratings
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920D (2020) https://doi.org/10.1117/12.2568705
Metrology of Adaptive and Wavefront-preserving Optics
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920G https://doi.org/10.1117/12.2570538
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920H (2020) https://doi.org/10.1117/12.2570604
Hirokatsu Yumoto, Haruhiko Ohashi, Hiroshi Yamazaki, Yasunori Senba, Takahisa Koyama, Kenji Tamasaku, Ichiro Inoue, Taito Osaka, Jumpei Yamada, et al.
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920I (2020) https://doi.org/10.1117/12.2570154
Yasunori Senba, Hirokatsu Yumoto, Takahisa Koyama, Takanori Miura, Hikaru Kishimoto, Yasuhiro Shimizu, Hiroshi Yamazaki, Haruhiko Ohashi
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920J https://doi.org/10.1117/12.2570168
X-ray Interferometry, Wavefront Sensing Techniques, and Characterization I
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920L (2020) https://doi.org/10.1117/12.2568499
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920M https://doi.org/10.1117/12.2568929
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920N (2020) https://doi.org/10.1117/12.2570007
X-ray Interferometry, Wavefront Sensing Techniques, and Characterization II
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920O (2020) https://doi.org/10.1117/12.2569135
Takenori Shimamura, Yoko Takeo, Takashi Kimura, Hirokazu Hashizume, Yasunori Senba, Hikaru Kishimoto, Haruhiko Ohashi, Hidekazu Mimura
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920P (2020) https://doi.org/10.1117/12.2569845
Shuai Zhao, Ke-yi Wang, Guang-yu Cheng, Yuan Shen, Yu-shan Wang, Lei Zhang
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920Q (2020) https://doi.org/10.1117/12.2576152
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