CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume PC12750 > Article
Presentation
22 November 2023 Sequence-defined polypeptoids as DUV and EUV chemically amplified resists
Cameron P. Adams, Xiangxi Meng, Florian H. Kaefer, Chenyun Yuan, Christopher K. Ober, Rachel A. Segalman
Author Affiliations +
Proceedings Volume PC12750, International Conference on Extreme Ultraviolet Lithography 2023; PC127500J (2023) https://doi.org/10.1117/12.2688477
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States
Abstract
As extreme ultraviolet lithography advances towards smaller feature sizes, controlling stochastics in resist materials is critical for maximizing performance. Most polymer photoresists have inherent chain-to-chain variations in molecular weight, composition, and sequence due to synthetic limitations. This, along with heterogeneities from the distribution of chemical additives, contributes to unacceptable levels of patterning defects. Polypeptoids are unique as a class of bio-inspired polymers that can be synthesized with perfectly defined sequence, composition, and molecular weight, yielding a uniform material. In this study, we present polypeptoid-based chemically amplified resists for EUVL and demonstrate the effects of sequence and functionality on patternability, as evaluated under DUV and electron-beam lithography.
Conference Presentation
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Cameron P. Adams, Xiangxi Meng, Florian H. Kaefer, Chenyun Yuan, Christopher K. Ober, and Rachel A. Segalman "Sequence-defined polypeptoids as DUV and EUV chemically amplified resists", Proc. SPIE PC12750, International Conference on Extreme Ultraviolet Lithography 2023, PC127500J (22 November 2023); https://doi.org/10.1117/12.2688477
ACCESS THE FULL ARTICLE
ORGANIZATIONAL
Sign in with credentials provided by your organization.
INSTITUTIONAL
Select your institution to access the SPIE Digital Library.
SELECT YOUR INSTITUTION
PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
PERSONAL SIGN IN
No SPIE Account? Create one
;
PURCHASE THIS CONTENT
SUBSCRIBE TO DIGITAL LIBRARY
50 downloads per 1-year subscription
Members: $195
Non-members: $335 ADD TO CART
25 downloads per 1 - year subscription
Members: $145
Non-members: $250 ADD TO CART
PURCHASE SINGLE ARTICLE
Includes PDF, HTML & Video, when available
Members: $17.00
Non-members: $21.00 ADD TO CART
PROCEEDINGS
 PRESENTATION
WATCH
PRESENTATION SAVE TO MY LIBRARY
GET CITATION
Advertisement
Advertisement
KEYWORDS
Chemically amplified resists
Deep ultraviolet
Extreme ultraviolet
Extreme ultraviolet lithography
Chemical composition
Optical lithography
Polymers
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top