Paper
1 September 1987 Photoetching Of Polymers With Excimer Lasers
Y. S. Liu, H. S. Cole, H. R. Philipp, R. Guida
Author Affiliations +
Abstract
Photoetching with excimer lasers has been studied in a variety of polymeric materials. Photoetching rates of polymers irradiated were measured at various laser wavelengths and fluences. The relationship of these results to the polymer absorption coefficient is examined. We propose that different mechanisms of photoetching may prevail, which depend on the absorption coefficient of the polymer. Potential use of this dry-etching process for lithography applications is evaluated.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Y. S. Liu, H. S. Cole, H. R. Philipp, and R. Guida "Photoetching Of Polymers With Excimer Lasers", Proc. SPIE 0774, Lasers in Microlithography, (1 September 1987); https://doi.org/10.1117/12.940398
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CITATIONS
Cited by 15 scholarly publications.
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KEYWORDS
Polymers

Absorption

Polymethylmethacrylate

Excimer lasers

Picosecond phenomena

Etching

Pulsed laser operation

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