Paper
17 September 1987 Quality Of Microlithographic Projection Lenses
Joseph Braat
Author Affiliations +
Proceedings Volume 0811, Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection; (1987) https://doi.org/10.1117/12.975593
Event: Fourth International Symposium on Optical and Optoelectronic Applied Sciences and Engineering, 1987, The Hague, Netherlands
Abstract
The quality of a finished objective for microlithographic applications depends on factors like the design data, the material properties and the manufacturing precision which can be achieved. With the paper design of an h-line lens (N.A.=0.38, field diameter 20mm) as a guideline we present data on the quality as predicted by the design and on the imperfections to he expected in a finished product.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joseph Braat "Quality Of Microlithographic Projection Lenses", Proc. SPIE 0811, Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection, (17 September 1987); https://doi.org/10.1117/12.975593
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Cited by 11 scholarly publications and 10 patents.
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KEYWORDS
Monochromatic aberrations

Lenses

Distortion

Inspection

Integrated optics

Glasses

Integrated circuits

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