The Chemical Nature And Practical Processing Characterization Of Positive Working Photoresists

Donald W. Frey

doi:10.1117/12.955354

8 August 1977 The Chemical Nature And Practical Processing Characterization Of Positive Working Photoresists

Donald W. Frey

Proceedings Volume 0100, Developments in Semiconductor Microlithography II; (1977) https://doi.org/10.1117/12.955354
Event: Developments in Semiconductor Microlithography II, 1977, San Jose, United States

Abstract

The chemical nature of positive working photoresists is examined in the choice of various components and their effect on the practical performance characteristics. The contribution of several potential resist components, alone and in combination, is described.

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Donald W. Frey "The Chemical Nature And Practical Processing Characterization Of Positive Working Photoresists", Proc. SPIE 0100, Developments in Semiconductor Microlithography II, (8 August 1977); https://doi.org/10.1117/12.955354

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KEYWORDS

Photoresist materials

Coating

Microelectronics

Optical lithography

Photoresist processing

Semiconductors

Visualization

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