In-depth analysis of indirect overlay method and applying in production environment

Detlef Hofmann; Frank Rabe; Stefan Buhl; Wan-Soo Kim; Boris Habets

doi:10.1117/12.2257963

28 March 2017 In-depth analysis of indirect overlay method and applying in production environment

Detlef Hofmann, Frank Rabe, Stefan Buhl, Wan-Soo Kim, Boris Habets

Proceedings Volume 10145, Metrology, Inspection, and Process Control for Microlithography XXXI; 101450E (2017) https://doi.org/10.1117/12.2257963
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

Overlay measurements are done for verification of the exposure and creation of process corrections for the next lots. As throughput of the overlay measurement tools is limited, it is desirable to avoid unnecessary measurements. Another concern can be that in-transparent stacks do not allow measuring a critical overlay relation directly. We developed methods for calculation of the overlay relation between two different layers between which there is no direct overlay measurement. We qualify the impact of sampling plans and the number of dependent layers. The indirect overlay calculation is applied on a significant high volume data set.

Conference Presentation

Citation Download Citation

Detlef Hofmann, Frank Rabe, Stefan Buhl, Wan-Soo Kim, and Boris Habets "In-depth analysis of indirect overlay method and applying in production environment", Proc. SPIE 10145, Metrology, Inspection, and Process Control for Microlithography XXXI, 101450E (28 March 2017); https://doi.org/10.1117/12.2257963

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