High precision laser photometer for laser optics

Yuan'an Zhao; Guohang Hu; Zhen Cao; Shijie Liu; Meiping Zhu; Jianda Shao

doi:10.1117/12.2270075

26 June 2017 High precision laser photometer for laser optics

Yuan'an Zhao, Guohang Hu, Zhen Cao, Shijie Liu, Meiping Zhu, Jianda Shao

Proceedings Volume 10329, Optical Measurement Systems for Industrial Inspection X; 103293N (2017) https://doi.org/10.1117/12.2270075
Event: SPIE Optical Metrology, 2017, Munich, Germany

Abstract

Development of laser systems requires optical components with high performance, and a high-precision double-beam laser photometer was designed and established to measure the optical performance at 1064nm. Double beam design and lock-in technique was applied to decrease the impact of light energy instability and electric noise. Pairs of samples were placed symmetrically to eliminate beam displacement, and laser scattering imaging technique was applied to determine the influence of surface defect on the optical performance. Based on the above techniques, transmittance and reflection of pairs of optics were obtained, and the measurement precision was improved to 0.06%. Different types of optical loss, such as total loss, volume loss, residual reflection and surface scattering loss, were obtained from the transmittance and reflection measurement of samples with different thickness. Comparison of optical performance of the test points with and without surface defects, the influence of surface defects on optical performance was determined. The optical performance of Nd-glass at 1064nm were measured as an example. Different types of optical loss and the influence of surface defects on the optical loss was determined.

Citation Download Citation

Yuan'an Zhao, Guohang Hu, Zhen Cao, Shijie Liu, Meiping Zhu, and Jianda Shao "High precision laser photometer for laser optics", Proc. SPIE 10329, Optical Measurement Systems for Industrial Inspection X, 103293N (26 June 2017); https://doi.org/10.1117/12.2270075

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