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The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org. The papers reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon. Please use the following format to cite material from these proceedings: Author(s), “Title of Paper,” in Photomask Technology 2017, edited by Peter D. Buck, Emily E. Gallagher, Proceedings of SPIE Vol. 10451 (SPIE, Bellingham, WA, 2017) Seven-digit Article CID Number. ISSN: 0277-786X ISSN: 1996-756X (electronic) ISBN: 9781510613768 ISBN: 9781510613775 (electronic) Published by SPIE P.O. Box 10, Bellingham, Washington 98227-0010 USA Telephone +1 360 676 3290 (Pacific Time)· Fax +1 360 647 1445 Copyright © 2017, Society of Photo-Optical Instrumentation Engineers. Copying of material in this book for internal or personal use, or for the internal or personal use of specific clients, beyond the fair use provisions granted by the U.S. Copyright Law is authorized by SPIE subject to payment of copying fees. The Transactional Reporting Service base fee for this volume is $18.00 per article (or portion thereof), which should be paid directly to the Copyright Clearance Center (CCC), 222 Rosewood Drive, Danvers, MA 01923. Payment may also be made electronically through CCC Online at copyright.com. Other copying for republication, resale, advertising or promotion, or any form of systematic or multiple reproduction of any material in this book is prohibited except with permission in writing from the publisher. The CCC fee code is 0277-786X/17/$18.00. Printed in the United States of America. Publication of record for individual papers is online in the SPIE Digital Library.
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AuthorsNumbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B … 0Z, followed by 10-1Z, 20-2Z, etc. Abdelghany, Hesham, 1N Abdo, Amr, 0V Ackmann, Paul, 1M Adam, Kostas, 0W Adelmann, Christoph, 0P Ahn, Byoung-Sup, 17 Anantha, Vidyasagar, 0L Ando, Akihiko, 0K Aupperle, David, 1D Babighian, Pietro, 1L Baron, Stanislas, 04, 0D Batarseh, Fadi, 1L Bevlin, Kristen, 15 Beyer, Dirk, 11 Biyajima, Tsuneaki, 0Q Bork, Ingo, 09, 1T Bouaricha, Ali, 08 Braylovska, Mariya, 0S Brunner, Johann, 14 Buck, Peter, 09, 1T Burns, John, 05 Buttgereit, Ute, 13 Candia, Nicolas, 14 Cao, Liang, 0Z, 1J Cao, Yu, 0D Capelli, Renzo, 0J Chen, Been-Der, 04, 0D Chen, Hong, 1K Chen, Norman, 0Z Chen, Yu, 06, 1N Chen, Yulu, 0S Cheng, Jackie, 0X Cheng, James, 0X Chien, Albert, 0X Choi, Jin, 17, 1B Chou, Hsin-Fu, 0X Chou, William, 0X Clifford, Chris, 0W Conklin, David, 0V Cross, Andrew, 0L D’havé, Koen, 11 Daneshpanah, Mehdi, 0X De Simone, Danilo, 0L Deshpande, Rohan, 1L Desineni, Rao, 1L Desouky, Tamer, 1L Dietzel, Martin, 0J Dornbusch, Kay, 13 Durvasula, Bhardwaj, 09 Eah, Sang-Kee, 1L Egodage, Kokila, 16 Eitapence, Scott, 0L Elshabrawy, Mohamed M., 0T Fenger, Germain, 0W Fong, Weichun, 0D Foubert, Philippe, 0L Fujimura, Aki, 03, 08 Gallagher, Emily E., 0P, 0R Gao, Shaowen, 0Z Garetto, Anthony, 16 Geerpuram, Dwarakanath, 15 Gehrke, Ralf, 0J Ghim, Young-Sik, 1R Ghosh, Dhriti Sundar, 1S Giesbers, A. J. M., 0O Goodwin, Francis, 0S Gookassian, John, 0Y Goonesekera, Arosha, 13 Grigas, Michelle M., 1A Guajardo, Marco A., 1N Guo, Eric, 1T, 1U Hœggström, Edward, 1Q Hagihara, Kazuki, 0H Hamaji, Masakazu, 04 Han, Zhenxing, 14 Hayashi, Naoya, 0H Hayashi, Tatsuya, 1B Hellweg, Dirk, 0J Hirano, Takashi, 0K Hiura, Mitsuru, 1B Horima, Yasuaki, 04 Horiuchi, Toshiyuki, 0G, 1I Hou, Jiechang, 0Z, 1J, 1L Howard, Sam, 14 Howell, Rafael C., 0D Hsu, Stephen D., 0D Hu, Xiang, 1M Hung, Dan, 05 Huyghebaert, Cedric, 0P Imoto, Kohei, 1B Inderhees, Gregg, 1D Inoue, Hideo, 17 Ishikawa, Hisako, 0Q Ito, Kaiki, 0G Ito, Yoshiyasu, 0H Itoh, Masamitsu, 0K Järvinen, Miikka, 1Q Jenkins, David, 13 Jeon, Chan-Uk, 17 Jiang, Wenchao, 1J, 1M Johnson, Chris, 15 Kalsbeck, Bill, 1D Kamo, Takashi, 0K Kassamakov, Ivan, 1Q Kersteen, Grizelda, 0J Khalil, Ahmed, 1L Khusnatdinov, Niyaz, 1A Kim, Young-Gwang, 1R Kimura, Atsushi, 1B Klootwijk, J. H., 0O Klostermann, Ulrich, 0S Koch, Markus, 0J Kohmura, Kazuo, 0Q Krumrey, Michael, 0R, 10 Kurganova, E., 0O Lam, Michael, 0W Laubis, Christian, 0R Lee, Heng-Jen, 0X Lee, Jae Uk, 0P Lee, Sang-Hee, 17 Lee, Yun-Woo, 1R Li, Chuanhai, 06 Li, Yifan, 1T Lin, Chenxi, 0D Lin, Yibo, 0A Litt, Lloyd, 1M Liu, Tsu-Jae King, 02 Lu, Colbert, 0X Lu, Cong, 1T, 1U Lu, Yen-Wen, 0D Lucas, Kevin, 1N Luo, Larry, 0D Lyu, Shizhi, 1T Maniyara, Rinu Abraham, 1S Marokkey, Sajan, 0S Matsumoto, Hiroshi, 17 Meersschaut, Johan, 0P Meyers, Gary, 07 Mishra, Kushlendra, 1T Mitsuhashi, Takashi, 0C Mo, Delin, 1T Moore, Bill, 05 Morgan, Michael, 15 Morishita, Keiko, 0K Morohoshi, Hiroshi, 1B Mouraille, Orion, 11 Naka, Masato, 0K Nasalevich, M., 0O Nie, Qiuping, 1D Niewczas, Mariusz, 08 Ning, Guoxiang, 0Z, 1M Notenboom, A., 0O Ogata, Kiyoshi, 0H Ohara, Shuichiro, 04 Okubo, Atsushi, 0Q Olate, Juan, 07 Omote, Kazuhiko, 0H Omran, Ahmed, 1N Ono, Yosuke, 0Q Otoshi, Kenji, 17 Ou, Jiaojiao, 0A Pallachali, Muhammed, 1L Pan, David Z., 0A Pang, Leo, 08 Parchuri, Anil, 1T Park, Jong-Mun, 17 Pearman, Ryan, 08 Pei, Jinhua, 06 Peter, M., 0O Petrov, Nicolai, 1L Pflüger, Mika, 10 Pollentier, Ivan, 0P, 0R Preil, Moshe, 0L Pruneri, Valerio, 1S Qian, Jin, 0L Raghunathan, Ananthan, 0W Rao, Nageswara, 09 Reddy, Murali, 09 Ren, Yuping, 1M Resnick, Douglas J., 1A Rhee, Hyug-Gyo, 1R Richard, Olivier, 0P Roelofs, Christian, 11 Rojas, Carlos, 0Y Russell, Guy, 13 Ryan, Deborah, 1L Sah, Kaushik, 0L Saito, Yasuko, 04 Samuels, Donald, 0V Sanapala, Ravikumar, 0L Santo, Izumi, 1U Sargsyan, Vahagn, 13 Sathisivan, Mogana Sundharam A/L, 06 Scholze, Frank, 0R, 10 Schulz, Kristian, 16 Scotti, Gianmario, 1Q Sezginer, Apo, 0X Sharma, Malavika, 09 Shendre, Abhishek, 08 Shi, Irene, 1U Shokale, Shweta, 1L Shu, Vincent, 04 Singhal, Shrawan, 1A Soltwisch, Victor, 10 Spence, Chris, 04 Sreenivasan, S. V., 1A Steinert, Steffen, 11 Straka, Joachim, 14 Sturtevant, John, 0W Su, Bo, 08 Su, Jing, 0D Suman, Shishir, 0L Sun, Dezheng, 0D Sun, Lei, 05, 0S Suzaki, Yoshio, 1B Suzuki, Yuta, 0G Symens, W., 0O Syrel, Oleg, 08 Tabbone, Gilles, 16 Takahashi, Hiroshi, 1I Tamamushi, Shuichi, 17 Tan, Alexander, 1D Taneichi, Daiki, 0Q Tang, Teck Jung, 1L Taniguchi, Rikiya, 0H Terry, Mark, 1L Tian, Mingjing, 1T Timmermans, Marina Y., 0P, 0R Twu, C. H., 0X Ueba, Ryosuke, 17 Vainikka, Tuomas, 1Q van de Kruijs, R. W. E., 0O Van den Heuvel, Dieter, 0L van der Zande, W. J., 0O van Dijk, Leon, 11 van Haren, Richard, 11 van Zwol, P. J., 0O Viswanathan, Ramya, 0V Vles, D., 0O Voorthuijzen, W. P., 0O Wang, Feng, 1L Wang, Shibing, 0D Wang, Wei-long, 1J Wassal, Amr G., 0T Westerman, Russ, 15 Wilkinson, William, 0Z Willis, Jan, 03 Wolke, Conrad, 0J Wood, Obert, 0S Wu, David, 0X Xu, Xiaoqing, 0A Yahya, Siti Noor Aisyah Binti, 06 Yam, Petrie, 14 Yamada, Hirokazu, 17 Yamanaka, Eiji, 0H Yamashita, Hiroshi, 17 Yang, Ho-Soon, 1R Yeh, Mike, 0X Yin, Haizhou, 1L Yoshikawa, Ryoji, 0K Zable, Harold, 08 Zachmann, Hendrik, 13 Zanelli, Claudio, 14 Zhang, Bosheng, 0X Zhang, Cuiping, 0D Zhang, Dongqing, 1J Zhang, Hongxin, 0Z Zhang, Jie, 0Z, 1J Zhang, Qiang, 1D Zhang, Quan, 04, 0D Zhang, Yixiao, 1L Zhou, Xiangyu, 0S Zou, Yi, 0D Conference CommitteeConference Chairs BACUS Steering Committee
Conference Program Committee
Session Chairs
IntroductionThe 2017 SPIE Photomask Technology Conference was held September 11-14 in Monterey, California, co-located for the first time with the EUV Lithography Conference. The organizers of these two conferences recognized their synergy and thought that a united conference would have value greater than the two held separately. Indeed, the combined conference integrated naturally and the increased attendance gave the conference a momentum not experienced in years. Since their first date went so well, these two conferences are expected to remain together for the foreseeable future. EUV lithography readiness for high volume production was the overriding theme of the conference with joint sessions on EUV readiness, pellicles, and inspection/metrology. A joint panel discussion explored options and strategies for early EUVL insertion without initial actinic inspection availability. The general consensus of the panelists and attendees was that this was not a technical barrier but did have a large impact on complexity, cost, and cycle time. Machine Learning is gaining more and more attention as organizations attempt to make sense of the huge amount of data collected in the process of manufacturing masks and integrated circuits. This year, for the first time, Photomask Technology included a Machine Learning session that explored use models and applications for this exciting emerging data analysis technology. Papers from the conference, covering the latest progress in all areas related to photomasks, follow in this proceedings. Peter D. Buck Emily E. Gallagher |
