Germanium implanted photonic devices for post-fabrication trimming and programmable circuits

Xia Chen; Milan M. Milosevic; Xingshi Yu; Bigeng Chen; Antoine F. J. Runge; Ali Z. Khokhar; Sakellaris Mailis; David J. Thomson; Anna C. Peacock; Shinichi Saito; Otto L. Muskens; Graham T. Reed

doi:10.1117/12.2503224

25 October 2018 Germanium implanted photonic devices for post-fabrication trimming and programmable circuits

Xia Chen, Milan M. Milosevic, Xingshi Yu, Bigeng Chen, Antoine F. J. Runge, Ali Z. Khokhar, Sakellaris Mailis, David J. Thomson, Anna C. Peacock, Shinichi Saito, Otto L. Muskens, Graham T. Reed

Author Affiliations +

Proceedings Volume 10823, Nanophotonics and Micro/Nano Optics IV; 108230U (2018) https://doi.org/10.1117/12.2503224
Event: SPIE/COS Photonics Asia, 2018, Beijing, China

Abstract

We reviewed our recent developments on the post-fabrication trimming techniques and programmable photonic circuits based on germanium ion implanted silicon waveguides. Annealing of ion implanted silicon can efficiently change the refractive index. This technology has been employed to fine-tune the optical phase, and therefore the operating point of photonic devices, enabling permanent correction of optical phase error induced by fabrication variations. High accuracy phase trimming was achieved with laser annealing and a real-time feedback control system. Erasable waveguides and directional couplers were also demonstrated, which can be used to implement programmable photonic circuits with low power consumption.

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Xia Chen, Milan M. Milosevic, Xingshi Yu, Bigeng Chen, Antoine F. J. Runge, Ali Z. Khokhar, Sakellaris Mailis, David J. Thomson, Anna C. Peacock, Shinichi Saito, Otto L. Muskens, and Graham T. Reed "Germanium implanted photonic devices for post-fabrication trimming and programmable circuits", Proc. SPIE 10823, Nanophotonics and Micro/Nano Optics IV, 108230U (25 October 2018); https://doi.org/10.1117/12.2503224

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