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6 February 2019 Design of bifocal compound eyes and gray mask fabrication based on maskless photolithography
Jianghui Liu, Junbo Liu, Qingyuan Deng, Yan Tang, Song Hu
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Proceedings Volume 10842, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology; 108421B (2019) https://doi.org/10.1117/12.2505369
Event: Ninth International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT2018), 2018, Chengdu, China
Abstract
Maskless photolithography was proposed to achieve the conventional and low-cost micro and nano fabrication, the pivotal of such technology was the application of digital micro-mirrors devices (DMD). Based on maskless photolithography, we designed a specific bifocal compound eyes (BCE) which made up of an array of two superimposed microlens. However, during our experiments, we found the existence of nonlinear relationships among gray levels, exposure intensity and development depths. To precise control the surface profiles, we did several tests and interpolations were used on the data we gathered. Finally, we ascertained the development depth of each grayscale, a gray mask was designed and filled to 1024*768 to fit the size of DMD.
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Jianghui Liu, Junbo Liu, Qingyuan Deng, Yan Tang, and Song Hu "Design of bifocal compound eyes and gray mask fabrication based on maskless photolithography", Proc. SPIE 10842, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology, 108421B (6 February 2019); https://doi.org/10.1117/12.2505369
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KEYWORDS
Optical lithography
Photomasks
Digital micromirror devices
Microlens
Micromirrors
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