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9 September 2019 Novel UV line beam system for large area processing with 248 nm (Withdrawal Notice)
Matthias Trenn, Ralph Delmdahl, Patrick Sperling
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Proceedings Volume 11105, Novel Optical Systems, Methods, and Applications XXII; 1110502 (2019) https://doi.org/10.1117/12.2529261
Event: SPIE Optical Engineering + Applications, 2019, San Diego, California, United States
Abstract
Publisher’s Note: This conference presentation and paper, originally published on 9 September 2019, was withdrawn on 13 May 2020 per author request.
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Matthias Trenn, Ralph Delmdahl, and Patrick Sperling "Novel UV line beam system for large area processing with 248 nm (Withdrawal Notice)", Proc. SPIE 11105, Novel Optical Systems, Methods, and Applications XXII, 1110502 (9 September 2019); https://doi.org/10.1117/12.2529261
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KEYWORDS
Excimer lasers
Graphene
Oxides
Thin films
Ultraviolet radiation
Laser applications
Electrodes
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