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17 October 2019 EUV Extendibility at 0.33 and 0.55NA (Conference Presentation)
Mark C. Phillips
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Proceedings Volume 11147, International Conference on Extreme Ultraviolet Lithography 2019; 1114702 (2019) https://doi.org/10.1117/12.2548654
Event: SPIE Photomask Technology + EUV Lithography, 2019, Monterey, California, United States
Abstract
Review of near and long term extension challenges for EUV lithography at 0.33 and 0.55NA. Focus on mask and infrastructure gaps + opportunities and a review of progress made in critical areas to support EUV extension.
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© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Mark C. Phillips "EUV Extendibility at 0.33 and 0.55NA (Conference Presentation)", Proc. SPIE 11147, International Conference on Extreme Ultraviolet Lithography 2019, 1114702 (17 October 2019); https://doi.org/10.1117/12.2548654
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