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In this work, we fabricated nano-arrays for high power antireflection applications using contact photolithography. Fortunately for the antireflection application, pattern periodicity is more important than obtaining the exact shape of the nanostructure. The fabricated structure, even though not the same as the original pattern, can still produce promising antireflection results. We have studied how the range of the distance between the mask and the photoresist affects the shapes of the produced patterns including holes, posts, and cones. The experimental results with different shapes and periodic patterns produced by different diffraction distances are explained with simulation results involving Fourier transformation and Fresnel diffraction of the mask patterns. |
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Photomasks
Optical lithography
Fourier transforms
Antireflective coatings
Gallium arsenide
Lithography
Nanolithography
